Gas purifier for moisture removal and used for semiconductor fabrication

● Suitable for nitrogen, hydrogen, oxygen, argon, helium and ammonia. The raw gas is not less than 99.999%.

● Deep removal of impurities O2, H2O, CO, CO2, H2, N2, CH2 and NMHC to 1ppB / 10ppB.

● Double tower alternate adsorption regeneration, single tower catalysis, terminal Getter adsorption, automatic continuous operation.

● EP class 316L polished stainless steel pipe fittings.

● With 0.003 m filter, removal rate can reach 99.999999% /99.99999%.

● Siemens PLC can be connected to DCS system.

● The security alarm function is perfect.

● Remote cloud service is available.

● Production and assembly in a super clean environment.

● Gas capacity 10-20000nm3 /h.